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Machine learning-based atom contribution method for the prediction of surface charge density profiles and solvent design
atom contribution computer-aided molecular design decomposition-based algorithm machine learning
2023/6/19
Solvents are widely used in chemical processes. The use of efficient model-based solvent selection techniques is an option worth considering for rapid identification of candidates with better economic...
Surface Charge-Driven Nanoengineering of Monodisperse Carbon Nanospheres with Tunable Surface Roughness
carbon nanospheres interfacial assembly surface charge surface roughness water dispersity
2023/6/19
Direct pyrolysis of polymer nanospheres usually leads to severe particle aggregation, uncontrolled surface morphology, and poor solvent dispersibility of the carbonaceous analogues. The successful man...
Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells
Simplifying Nanosphere Lithography Solar Cells
2008/10/30
A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surfac...